Etching in microsystem technology

Köhler, J. Michael 1956-

Etching in microsystem technology Elektronische Ressource Michael Köhler; translated by Antje Wiegand - Weinheim ;New York Wiley-VCH c1999 - Online-Ressource (xvi, 368 p) ill

Includes bibliographical references ([345]-360) and index

Etching in Microsystem Technology; Preface; Contents; Table of Contents; Symbols; Abbreviations; 1 Introduction; 2 Distinctive Features of Microtechnical Etching; 3 Wet-Chemical Etching Methods; 4 Dry-Etching Methods; 5 Microforming by Etching of Locally Changed Material; 6 Chosen Recipes; References; Index..

Microcomponents and microdevices are increasingly finding application in everyday life. The specific functions of all modern microdevices depend strongly on the selection and combination of the materials used in their construction, i.e., the chemical and physical solid-state properties of these materials, and their treatment. The precise patterning of various materials, which is normally performed by lithographic etching processes, is a prerequisite for the fabrication of microdevices. The microtechnical etching of functional patterns is a multidisciplinary area, the basis for the etching proc

Palo Alto, Calif
Electronic reproduction; Available via World Wide Web

3527295615 9783527295616 3527613781 9783527613786

10.1002/9783527613786 doi

Plasma etching
Masks (Electronics)



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