Plasma processing and processing science / (Record no. 456232)

MARC details
000 -LEADER
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001 - CONTROL NUMBER
control field ocm58567010
003 - CONTROL NUMBER IDENTIFIER
control field OCoLC
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20210212150112.0
006 - FIXED-LENGTH DATA ELEMENTS--ADDITIONAL MATERIAL CHARACTERISTICS
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007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr cnu|||unuuu
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 050323s1995 dcu o 000 0 eng d
040 ## - CATALOGING SOURCE
Original cataloging agency N$T
Language of cataloging eng
Description conventions pn
Transcribing agency N$T
Modifying agency OCLCQ
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019 ## -
-- 325461980
-- 473582520
-- 475481383
-- 614454685
-- 646727504
-- 888829131
-- 923270352
-- 961531223
-- 962664382
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 0309575168
Qualifying information (electronic bk.)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9780309575164
Qualifying information (electronic bk.)
029 1# - (OCLC)
OCLC library identifier AU@
System control number 000053251176
029 1# - (OCLC)
OCLC library identifier DEBBG
System control number BV043147321
029 1# - (OCLC)
OCLC library identifier DEBBG
System control number BV044108030
029 1# - (OCLC)
OCLC library identifier DEBSZ
System control number 422346373
029 1# - (OCLC)
OCLC library identifier GBVCP
System control number 801266742
029 1# - (OCLC)
OCLC library identifier NZ1
System control number 12807547
035 ## - SYSTEM CONTROL NUMBER
System control number (OCoLC)58567010
Canceled/invalid control number (OCoLC)325461980
-- (OCoLC)473582520
-- (OCoLC)475481383
-- (OCoLC)614454685
-- (OCoLC)646727504
-- (OCoLC)888829131
-- (OCoLC)923270352
-- (OCoLC)961531223
-- (OCoLC)962664382
050 #4 - LIBRARY OF CONGRESS CALL NUMBER
Classification number TA2020
Item number .P5 1995eb
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC
Subject category code subdivision 009070
Source bisacsh
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.044
Edition number 22
049 ## - LOCAL HOLDINGS (OCLC)
Holding library MAIN
245 00 - TITLE STATEMENT
Title Plasma processing and processing science /
Statement of responsibility, etc. Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication, distribution, etc. Washington, D.C. :
Name of publisher, distributor, etc. National Academy Press,
Date of publication, distribution, etc. 1995.
300 ## - PHYSICAL DESCRIPTION
Extent 1 online resource (x, 35 pages)
336 ## - CONTENT TYPE
Content type term text
Content type code txt
Source rdacontent
337 ## - MEDIA TYPE
Media type term computer
Media type code c
Source rdamedia
338 ## - CARRIER TYPE
Carrier type term online resource
Carrier type code cr
Source rdacarrier
347 ## - DIGITAL FILE CHARACTERISTICS
File type data file
Source rda
490 1# - SERIES STATEMENT
Series statement NRL strategic series
500 ## - GENERAL NOTE
General note Committee chair: Francis F. Chen.
500 ## - GENERAL NOTE
General note This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.
588 0# - SOURCE OF DESCRIPTION NOTE
Source of description note Print version record.
505 0# - FORMATTED CONTENTS NOTE
Formatted contents note Plasma Processing and Processing Science -- Copyright -- Preface -- Contents -- Chapter 1 Introduction and Summary -- Chapter 2 Modeling and Simulation of Plasma Processing -- RESEARCH OPPORTUNITIES -- Requirements of the Microelectronics Fabrication Industry -- Multidimensional Models -- Plasma Chemistry -- Surface Chemistry -- Electromagnetics -- Current Status of Modeling and Simulation -- Particle-in-Cell Simulations -- Kinetic Models -- Fluid or Hydrodynamic Models -- Hybrid Models -- A ROLE FOR NRL -- Chapter 3 Semiconductor Processing
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note RESEARCH OPPORTUNITIESA ROLE FOR NRL -- Development and Characterization of Precompetitive Materials and Processes -- Comparative Analysis and Characterization of Tools and Processes in Development -- Sensor Development for Control and Fingerprinting of Manufacturing Processes -- Chapter 4 Plasma Deposition and Polymerization -- RESEARCH OPPORTUNITIES -- Semiconductor Fabrication -- Barrier Coatings -- Fibrous Materials -- Optical Coatings and Photonics -- Plasma Polymerization -- A ROLE FOR NRL -- Chapter 5 Ion Implantation and Surface Modification
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note RESEARCH OPPORTUNITIESIntroduction -- Plasma and Ion Beam Implantation Technology -- Ion Beam Implantation -- Plasma Source Ion Implantation -- Applications -- Implantation of Metals -- Implantation of Nonmetals -- A ROLE FOR NRL -- Chapter 6 Thermal Plasmas -- RESEARCH OPPORTUNITIES -- Introduction -- Plasma Spraying -- Plasma Chemical Vapor Deposition -- Plasma Waste Destruction -- Plasma Metallurgy -- Thermal Plasma Synthesis -- Plasma Consolidation -- A ROLE FOR NRL -- Thermal Plasma Waste Destruction -- Plasma Chemical Vapor Deposition
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note Diamond FilmsCubic Boron Nitride Films -- Carbon Nitride -- Chapter 7 Flat Panel Displays -- RESEARCH OPPORTUNITIES -- Introduction -- Passive Matrix Liquid Crystal Display -- Active Matrix Liquid Crystal Display -- Amorphous Silicon -- Polycrystalline Silicon -- Transfer Silicon -- Thin Film Electroluminescent Displays -- Digital Micromirror Devices -- Plasma Displays -- Field Emission Displays -- A ROLE FOR NRL -- Chapter 8 Low-Temperature Plasma Physics -- RESEARCH OPPORTUNITIES -- A ROLE FOR NRL -- Chapter 9 Conclusions and Recommendations
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Plasma engineering.
9 (RLIN) 153330
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Semiconductors
General subdivision Etching.
9 (RLIN) 148240
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Plasma etching.
9 (RLIN) 2381
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element TECHNOLOGY & ENGINEERING
General subdivision Mechanical.
Source of heading or term bisacsh
9 (RLIN) 14450
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Plasma engineering.
Source of heading or term fast
Authority record control number (OCoLC)fst01066322
9 (RLIN) 153330
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Plasma etching.
Source of heading or term fast
Authority record control number (OCoLC)fst01066327
9 (RLIN) 2381
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Semiconductors
General subdivision Etching.
Source of heading or term fast
Authority record control number (OCoLC)fst01112219
9 (RLIN) 148240
655 #4 - INDEX TERM--GENRE/FORM
Genre/form data or focus term Electronic books.
9 (RLIN) 396
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Chen, Francis F.,
Dates associated with a name 1929-
9 (RLIN) 338471
710 2# - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element National Research Council (U.S.).
Subordinate unit Panel on Plasma Processing.
9 (RLIN) 338472
710 2# - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element National Research Council (U.S.).
Subordinate unit Naval Studies Board.
9 (RLIN) 221034
710 2# - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element National Research Council (U.S.).
Subordinate unit Commission on Physical Sciences, Mathematics, and Applications.
9 (RLIN) 230584
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Relationship information Print version:
Title Plasma processing and processing science.
Place, publisher, and date of publication Washington, D.C. : National Academy Press, 1995
Record control number (OCoLC)32785090
830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE
Uniform title NRL strategic series.
9 (RLIN) 265383
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=123670">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=123670</a>
938 ## -
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938 ## -
-- YBP Library Services
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994 ## -
-- 92
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Holdings
Withdrawn status Lost status Damaged status Not for loan Collection code Home library Current library Date acquired Total Checkouts Date last seen Price effective from Koha item type
  Not Lost     EBook e-Library e-Library 12/02/2021   12/02/2021 12/02/2021 eBook

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