Etching in microsystem technology Elektronische Ressource Michael Köhler; translated by Antje WiegandMaterial type: Computer fileLanguage: English Publication details: Weinheim ;New York Wiley-VCH c1999 Description: Online-Ressource (xvi, 368 p) illISBN: 3527295615; 9783527295616; 3527613781; 9783527613786Uniform titles: Ätzverfahren für die Mikrotechnik. <engl.> Subject(s): Microlithography | Plasma etching | Masks (Electronics)Additional physical formats: No title; No titleDDC classification: 621.3815/31 LOC classification: TK7872.M3Online resources: Click here to access online
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Includes bibliographical references (-360) and index
Etching in Microsystem Technology; Preface; Contents; Table of Contents; Symbols; Abbreviations; 1 Introduction; 2 Distinctive Features of Microtechnical Etching; 3 Wet-Chemical Etching Methods; 4 Dry-Etching Methods; 5 Microforming by Etching of Locally Changed Material; 6 Chosen Recipes; References; Index..
Microcomponents and microdevices are increasingly finding application in everyday life. The specific functions of all modern microdevices depend strongly on the selection and combination of the materials used in their construction, i.e., the chemical and physical solid-state properties of these materials, and their treatment. The precise patterning of various materials, which is normally performed by lithographic etching processes, is a prerequisite for the fabrication of microdevices. The microtechnical etching of functional patterns is a multidisciplinary area, the basis for the etching proc
Online-Ausg. Palo Alto, Calif ebrary 2009 Electronic reproduction; Available via World Wide Web |2009||||||||||